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Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]

著者名:
Kim, S. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Chalykh, R. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S. G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H. K. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J. T. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 3 件
掲載資料名:
Emerging Lithographic Technologies X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6151
発行年:
2006
パート:
1
開始ページ:
61511C
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
言語:
英語
請求記号:
P63600/6151
資料種別:
国際会議録

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