Novel low thermal expansion material for EUV application [6151-47]
- 著者名:
- Kawata, M. ( Asahi Glass Co., Ltd. (Japan) )
- Takada, A. ( Asahi Glass Co., Ltd. (Japan) )
- Hayashi, H. ( Asahi Glass Co., Ltd. (Japan) )
- Sugimoto, N. ( Asahi Glass Co., Ltd. (Japan) )
- Kikugawa, S. ( Asahi Glass Co., Ltd. (Japan) )
- 掲載資料名:
- Emerging Lithographic Technologies X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6151
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61511A
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461940 [0819461946]
- 言語:
- 英語
- 請求記号:
- P63600/6151
- 資料種別:
- 国際会議録
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Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography [5992-198]
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