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Recovery of GaN surface after reactive ion etching (Invited Paper) [6121-26]

著者名:
  • Fan, Q. ( Virginia Commonwealth Univ. (USA) )
  • Chevtchenko, S. ( Virginia Commonwealth Univ. (USA) )
  • Ni, X. ( Virginia Commonwealth Univ. (USA) )
  • Cho, S. J. ( Virginia Commonwealth Univ. (USA) )
  • Morkoc H ( Virginia Commonwealth Univ. (USA) )
掲載資料名:
Gallium Nitride Materials and Devices
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6121
発行年:
2006
開始ページ:
61210Q
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461636 [0819461636]
言語:
英語
請求記号:
P63600/6121
資料種別:
国際会議録

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