Modeling of sacrificial spin-on galss (SOG) etching in non-straight microchannels using hydrofluoric acid [6037-72]

Modeling of sacrificial spin-on galss (SOG) etching in non-straight microchannels using hydrofluoric acid [6037-72]

著者名:

Hamzah A. A
Majils B. Y
Ahmad I. ( Univ. Kebabgsaan Malasia (Malaysia) )

掲載資料名:

Device and process technologies for microelectronics, MEMS, and photonics IV : 12-14 December 2005, Brisbane, Australia

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6037

発行年:

2006

開始ページ:

60371O

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460684 [0819460680]

言語:

英語

請求記号:

P63600/6037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016072
シリーズID:	PA00000029
会議名:	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for microelectronics, MEMS, and photonics
回次:	2005 : 4th
会議開催地:	Brisbane, Australia
会議開催年:	2005.12.12-2005.12.14

類似資料:

1 国際会議録 Formation of thick spin-on glass (SOG) sarcrificial layer for capacitive acceleromete encapsulation [6037-34] Hamzah A. A, Majlis B. Y, Ahmad I. SPIE - The International Society of Optical Engineering	7 国際会議録 High Catalytic Activity of Palladium for Metal-Enhanced Hydrofluoric Acid Etching of Silicon S. Yae, M. Tashiro, T. Hirano, M. Abe, N. Fukumuro Electrochemical Society
2 国際会議録 KOH etching process of perfect square MEMS corrugated diapram [6037-87] Soin N., Majils B. Y SPIE - The International Society of Optical Engineering	8 国際会議録 Lateral Etch Study of Thin Films Using Hydrofluoric Acid Chemistries for MEMS Devices Matamis, G., Wang, Chuan-Che, Gogot, B. Electrochemical Society
3 国際会議録 Fabrication of microstructure using electrochemical etching in hydrofluoric acid Huang, J.-Y., Tsai, H.-Y., Wu, C.-H., Su, C.-C., Fan, C.-H. SPIE-The International Society for Optical Engineering	9 国際会議録 Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal Witvrouw,A., Bois,B.Du, Moor,P.De, Verbist,A., Hoof,C.A.Van, Bender,H., Baert,K. SPIE-The International Society for Optical Engineering
4 国際会議録 Aspheric galss lens modeling and machinig (5874-11) Johnson, R. B., Mandina, M. SPIE - The International Society of Optical Engineering	10 国際会議録 Self-Formation of Au Microwires on Au-Covered Si Electrode Surface by Electrochemical Etching in Dilute Hydrofluoric Acid Solution Kimura, Yasuo, Nemoto, Jun, Kusakabe, Atsushi, Kondo, Yusuke, Niwano, Michio Materials Research Society
5 国際会議録 ETCHING SILICON NITRIDE AND SILICON OXIDE USING ETHYLENE GLYCOL/HYDROFLUORIC ACID MIXTURES Wood, Alison, Detterbeck, Stefan Electrochemical Society	11 国際会議録 Liberation of Ion Implanted Ge Nanocrystals From a Silicon Dioxide Matrix via Hydrofluoric Acid Vapor Etching Sharp, I. D., Xu, Q., Liao, C. Y., Ager III, J. W., Beeman, J. W., Yu, K. M., Zakharov, D., Lilienta-Weber, Z., Haller, … Materials Research Society
6 国際会議録 Study on Reactive Species in Catalyst-Referred Etching of 4H-SiC using Platinum and Hydrofluoric Acid A. Isohahsi, Y. Sano, T. Okamoto, K. Tachibana, K. Arima Trans Tech Publications	12 国際会議録 Characterization of deep wet etching of glass (Invited Paper) [6037-10] lliescu C., Chen B., Tay F. E. H, National Univ. of singapore (Singapore), Institute of Bioengineering and … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12