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Measurement of residual stress in multilayered thin films by a full-field optical method [6032-21]

著者名:
掲載資料名:
ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6032
発行年:
2006
開始ページ:
60320L
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460639 [081946063X]
言語:
英語
請求記号:
P63600/6032
資料種別:
国際会議録

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