Study of lag effect in LPHD plasma etching ofSi for MEMS applications by variable time steps in numerical methods [6032-17]

Study of lag effect in LPHD plasma etching ofSi for MEMS applications by variable time steps in numerical methods [6032-17]

著者名:

Zhang, J.
Huang, -A. Q.
Li, -H. W. ( Southeast Univ. (China) )

掲載資料名:

ICO20 : MEMS, MOEMS, and NEMS : 21-26 August, 2005, Changchun, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6032

発行年:

2006

開始ページ:

60320H

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460639 [081946063X]

言語:

英語

請求記号:

P63600/6032

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016067
シリーズID:	PA00000029
会議名:	ICO
回次:	2005 : 20th
会議開催地:	Changchun, China
会議開催年:	2005.08.21-2005.08.26

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