Substrate bias effect on preparation of nanocrystalline silicon carbide thin films in helicon wave plasma chemical vapor depostion [6029-34]

Substrate bias effect on preparation of nanocrystalline silicon carbide thin films in helicon wave plasma chemical vapor depostion [6029-34]

著者名:

Yu W.
Lu W.
Wang C.
Ding W.
Fu G. ( Hebei Univ. (China) )

掲載資料名:

ICO20 : materials and nanostructures : 21-26 August, 2005, Changchun, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6029

発行年:

2006

開始ページ:

60290Y

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460608 [0819460605]

言語:

英語

請求記号:

P63600/6029

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016064
シリーズID:	PA00000029
会議名:	ICO
回次:	2005 : 20th
会議開催地:	Changchun, China
会議開催年:	2005.08.21-2005.08.26

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