Process control and material properties of thin electroless Co-based capping layers for copper interconnects (Invited Paper) [6002-25]
- 著者名:
Petrov N. Valverde C. Chen Q. Xu C. Paneccasio V. Stritch D. Witt C. ( Enthone Inc. (USA); ) Walker E. Barnes J. ( ATMI (USA); ) Pavlov M. Shalyt E. ( ECI Technology (USA); ) - 掲載資料名:
- Nanofabrication: Technologies, Devices, and Applications II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6002
- 発行年:
- 2005
- 開始ページ:
- 60020O
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460264 [0819460265]
- 言語:
- 英語
- 請求記号:
- P63600/6002
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
American Institute of Chemical Engineers |
American Institute of Chemical Engineers | |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
Materials Research Society |
5
国際会議録
Properties and Barrier Material Interactions of Electroless Copper Used for Seed Enhancement
Materials Research Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |