Characteristics of RIE lag and pattern density effect in alternating aperture phase-shift masks [5992-126]
- 著者名:
Chang, B. -S. Chang, Y. -Y. Bang, S. -H. Lee, I. -S. Kim, L. -J. Ahn, C.-N. Kim, H. -S. ( Toppan Photomasks Korea Ltd. (South Korea) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 59923Q
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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