Inverse lithography technology: electrical verification of SRAM cell pattern [5992-101]
- 著者名:
- Balasinski, A. ( Cypress Semiconductor Corp. (USA) )
- Moore, A. ( Luminescent Technologies Inc. (USA) )
- Shamma, N. ( Cypress Semiconductor Corp. (USA) )
- Lin, T. ( Luminescent Technologies Inc. (USA) )
- Yang, H. ( Cypress Semiconductor Corp. (USA) )
- 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 599230
- 終了ページ:
- 599230
- 総ページ数:
- 1
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
国際会議録
Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]
SPIE - The International Society of Optical Engineering |
11
国際会議録
Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |