Shot reduction technique for character projection lithography using combined cell stencil [5992-96]
- 著者名:
- Kazama, T.
- Ikeda, M.
- Asada, K. ( Univ. of Tokyo (Japan) )
- 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 59922V
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Shot minimization for throughput improvement of character projection electron beam direct writing
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
国際会議録
Defect printability analysis on electron projection lithography with diamond stencil reticle
SPIE-The International Society for Optical Engineering |
9
国際会議録
Technology mapping technique for throughput enhancement of character projection equipment [6151-36]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
11
国際会議録
Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |