Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
- 著者名:
Bekaert, J. Philipsen, V. Vandenberghe, G. ( IMEC (Belgium) ) van den Broeke, D. ( ASML MAskTools Inc. (USA) ) Degel, W. Zibold, A. ( Carl Zeiss SMS GmbH (Germany) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 59921O
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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