Gray scaling in high performance optical pattern generators [5992-30]

Gray scaling in high performance optical pattern generators [5992-30]

著者名:

Martinsson, H.
Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )
Rockwell, B. ( Photronics Inc. (USA) )

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

59920T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

類似資料:

1 国際会議録 Gray scaling in high performance mask making [5853-94] Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	7 国際会議録 Resist process optimization for a DUV laser pattern generator Fosshaug, H.A., Bajramovic, A., Karlsson, J., Xing, K., Rosendahl, A., Dahlberg, A., Bjoernberg, C., Bjuggren, M., … SPIE - The International Society of Optical Engineering
2 国際会議録 RET for optical maskless lithography Sandstrom, T., Martinsson, H. SPIE - The International Society of Optical Engineering	8 国際会議録 New approach to data preparation and processing for high-density patterns Thuren,A., Sandstrom,T. SPIE-The International Society for Optical Engineering
3 国際会議録 Transparent corner enhancement scheme for a DUV pattern generator Martinsson, H., Hellgren, J., Eriksson, N., Bjuggren, M., Sandstrom, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Mask lithography assessment for 45nm node technology [5992-29] Mackay, R. S., Kamberian, H., Rockwell, B. SPIE - The International Society of Optical Engineering
4 国際会議録 Rasterizing for SLM-based mask making and maskless lithography Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	10 国際会議録 Phase-shifting optical maskless lithography enabling ASICs at the 65- and 45-nm nodes Sandstrom, T., Ljungblad, U. B. SPIE - The International Society of Optical Engineering
5 国際会議録 New architecture for laser pattern generators for 130 nm and beyond Ljungblad,U.B., Sandstrom,T., Buhre,H., Durr,P., Lakner,H. SPIE-The International Society for Optical Engineering	11 国際会議録 Printing sub-100-nm random logic patterns using binary masks and synthetic-aperture lithography (SAL) Sandstrom,T. SPIE-The International Society for Optical Engineering
6 国際会議録 Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond Sandstrom,T., Fillion,T.I., Ljungblad,U.B., Rosling,M. SPIE-The International Society for Optical Engineering	12 国際会議録 Resolution extensions in the Sigma7000 imaging paftern generator Sandstrom, T., Eriksson, N. SPIE-The International Society for Optical Engineering

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