A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect [5992-25]
- 著者名:
Jang, I. -Y. Park, Y. -J. Kwon, H. -J. Moon, S. -Y. Choi, S. -W. Han, W. S. ( Samsung Electronics Co., Ltd (South Korea) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 59920O
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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3
国際会議録
The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |