Low energy inductively coupled plasma etching of HgCdTe [5964-07]
- 著者名:
Hu, X. Ye, Z. Ding, R. He, L. ( Shanghai Institute of Technical Physics, CAS (China) ) Tan, G. ( Oxford Instrument Plasma Technology (Singapore) ) Deng, L. ( Oxford Instrument Plasma Technology (United Kingdom)) ) - 掲載資料名:
- Detectors and associated signal processing II : 13-14 September 2005, Jena, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5964
- 発行年:
- 2005
- 開始ページ:
- 596408
- 終了ページ:
- 596408
- 総ページ数:
- 1
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819459824 [0819459828]
- 言語:
- 英語
- 請求記号:
- P63600/5964
- 資料種別:
- 国際会議録
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