Integrated nano-optic devices based on immersion nano-gratings made by imprint- lithography and nano-trench-filling technology [5931-13]
- 著者名:
Wang, J. Deng, X. Sciortino, P. Varghese, R. Nikolov, A. Liu, F. Chen, L. ( NanoOpto Corp. (USA) ) - 掲載資料名:
- Nanoengineering: fabrication, properties, optics, and devices II : 3-4 August, 2005, San Diego, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5931
- 発行年:
- 2005
- 開始ページ:
- 59310C
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819459367 [0819459364]
- 言語:
- 英語
- 請求記号:
- P63600/5931
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Trans Tech Publications |