Comparisons between EUV at-wavelength metrological methods [5921-15]
- 著者名:
Sugisaki, K. Okada, M. Zhu, Y. Otaki, K. Liu, Z. Kawakami, J. Ishii, M. Saito, J. Murakami, K. ( EUVA Sagamihara R&D Ctr. (Japan) ) Hasegawa, M. Ouchi, C. Kato, S. Hasegawa, T. Suzuki, K. Yokota, H. ( Euva Utsunomiya R&R CTr. (Japan) ) Niibe, M. ( Univ. of Hoyogo (Japan) ) Takeda, M. ( Univ. of Electro-Communications (Japan) ) - 掲載資料名:
- Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5921
- 発行年:
- 2005
- 開始ページ:
- 59210D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819459268 [0819459267]
- 言語:
- 英語
- 請求記号:
- P63600/5921
- 資料種別:
- 国際会議録
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