Impact of High-k Properties on MOSFET Electrical Characteristics
- 著者名:
Pantisano, Ll. Ragnarsson, L. -A. Houssa, M. Degraeve, R. Groeseneken, G. Schram, T. Degendt, S. Heyns, M. Afanas'ev, V. - 掲載資料名:
- Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices
- シリーズ名:
- NATO science series. Series 2, Mathematics, physics and chemistry
- シリーズ巻号:
- 220
- 発行年:
- 2006
- 開始ページ:
- 97
- 終了ページ:
- 109
- 総ページ数:
- 13
- 出版情報:
- Dordrecht: Springer
- ISBN:
- 9781402043659 [1402043651]
- 言語:
- 英語
- 請求記号:
- N17050/220
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
2
国際会議録
13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS-Materials Research Society |
Materials Research Society |