Co2Si, CrSi2, ZrSi2, and TiSi2 Formation Studied by a Radioactive 31Si Marker Technique
- 著者名:
- 掲載資料名:
- Thin films and interfaces : proceedings of the Materials Research Society Annual Meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 10
- 発行年:
- 1982
- 開始ページ:
- 129
- 終了ページ:
- 136
- 総ページ数:
- 8
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444007742 [0444007741]
- 言語:
- 英語
- 請求記号:
- M23500/10
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
North-Holland |
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
11
国際会議録
Facilitated C54-TiSi2 Formation With Elevated Deposition Temperature: A Study of Co-Deposited Layers
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |