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THE MICROSTRUCTURE OF SILICON-ON-INSULATOR STRUCTURES FORMED BY HIGH DOSE OXYGEN ION IMPLANTATION

著者名:
掲載資料名:
Metastable materials formation by ion implantation : proceedings of the Materials Research Society annual meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
7
発行年:
1982
開始ページ:
401
終了ページ:
408
総ページ数:
8
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444006929 [0444006923]
言語:
英語
請求記号:
M23500/7
資料種別:
国際会議録

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