A SPECTROSCOPIC INVESTIGATION OF THE AMORPHOUS TO MICROCRYSTALLINE TRANSITION IN SILICON PREPARED BY REACTIVE MAGNETRON SPUTTERING

A SPECTROSCOPIC INVESTIGATION OF THE AMORPHOUS TO MICROCRYSTALLINE TRANSITION IN SILICON PREPARED BY REACTIVE MAGNETRON SPUTTERING

著者名:

掲載資料名:

Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

297

発行年:

1993

開始ページ:

521

終了ページ:

526

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991934 [155899193X]

言語:

英語

請求記号:

M23500/297

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015781
シリーズID:	PA00000011
会議名:	Symposium on amorphous silicon technology
回次:	1993
会議開催地:	San Francisco, CA, USA
会議開催年:	1993.04.13-1993.04.16

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2 国際会議録 DEPOSITION OF MICROCRYSTALLINE Si,Ge (ｦﾌc-Si,Ge) ALLOYS BY REACTIVE MAGNETRON SPUTTERING Cho, S. M., Wolfe, D., He, S. S., Christensen, K., Maher, D. M., Lucovsky, G. MRS - Materials Research Society	8 国際会議録 Electric and Optical Properties of ｦﾌc-Si,Ge:H Alloys Deposited by Reactive Magnetron Sputtering (RMS) Cho, S. M., Wolfe, D., Christensen, K., Lucovsky, G., Maher, D. M. MRS - Materials Research Society
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