MICROSTRUCTURE AND PROPERTIES OF CoSi2 THIN FILMS ON (100) SILICON BY LASER PHYSICAL VAPOR DEPOSITION

MICROSTRUCTURE AND PROPERTIES OF CoSi2 THIN FILMS ON (100) SILICON BY LASER PHYSICAL VAPOR DEPOSITION

著者名:

掲載資料名:

Laser ablation in materials processing : fundamentals and applications : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

285

発行年:

1993

開始ページ:

533

終了ページ:

538

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991804 [1558991808]

言語:

英語

請求記号:

M23500/285

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015769
シリーズID:	PA00000011
会議名:	Symposium on laser ablation in materials processing
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.12.01-1992.12.04

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