RADIATION HARDENING OF SIMOX BURIED OXIDE BY NITRIDATION

RADIATION HARDENING OF SIMOX BURIED OXIDE BY NITRIDATION

著者名:

掲載資料名:

Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

284

発行年:

1993

開始ページ:

587

終了ページ:

594

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991798 [1558991794]

言語:

英語

請求記号:

M23500/284

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015768
シリーズID:	PA00000011
会議名:	Symposium on amorphous insulating thin films
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.12.01-1992.12.04

類似資料:

1 国際会議録 RADIATION-INDUCED OXIDE CHARGE DISTRIBUTIONS IN SIMOX BURIED OXIDES Hwang, J. M., Bartko, J., Rai-Choudhury, P., Bailey, W. E. Materials Research Society	7 国際会議録 Behaviour of buried oxides in SOl-SIMOX transistors under ionizing radiation Berland, V., Touboul, A., Flament, O. Electrochemical Society
2 国際会議録 Electrochemical analysis of SIMOX buried oxides Allen, L P, Anc, M J, Duffy, M, Parechanian, J H, Yap, J H Electrochemical Society	8 国際会議録 Relaxable, slow charge trapping on silicon-on-insulator (SOT) mesa sidewalls Karulkar, P.C. Electrochemical Society
3 国際会議録 Experimental investigations of thermal conductivity of buried oxides in SIMOX and BESOI wafers Tenbroek, B.M., Whiting, G., Lee, M.S.L., Edwards, C.F., Redman-White, W. Electrochemical Society	9 国際会議録 High current injected charge-to-breakdown characteristics of thin gate oxide on SIMOX SOI having different buried oxide thicknesses Seo, J-H, Woo, J C, Mendicino, M, Vasudev, P K Electrochemical Society
4 国際会議録 Implications of thin buried-oxide for SIMOX circuit performance Alles, M., Krull, W., Allen, L. Electrochemical Society	10 国際会議録 Infrared absorption study of buried oxides of single and triple implanted SIMOX structures Lisovskii, I P, Revesz, A G, Hughes, H L Electrochemical Society
5 国際会議録 Cryogenic investigations of SIMOX buried oxide parameters Lysenko, V.S., Tyagulski, I.P., Osiyuk, I.N., Gomeniuk, Y.V. Kluwer Academic Publishers	11 国際会議録 Ultra thin buried oxide layers formed by low dose SIMOX processes Aspar, B., Pudda, C., Papon, A.M., Auberton-Herve, A.J., Lamure, J.M. Electrochemical Society
6 国際会議録 RADIATION RESISTANT SILICON-ON-DIAMOND (SOD) MISFETs Annamalai, N.K., Karulkar, P.C., Sawyer, J. Electrochemical Society	12 国際会議録 CAVITY FORMATION IN SIMOX STRUCTURES El-Ghor, M. K., Pennycook, S. J., Sjoreen, T. P., White, C. W., Narayan, J. Materials Research Society

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