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COMPARISON OF THE DENSITY AND DISTRIBUTION OF TRAPS GENERATED BY HIGH VOLTAGE STRESS IN SILICON OXIDE AND SILICON OXYNITRIDES

著者名:
Richardson, J.T.
Dumin, D.J.
Lo, G.Q.
Kwong, D.L.
Gross, B.J.
Sodini, C.G.
さらに 1 件
掲載資料名:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
284
発行年:
1993
開始ページ:
357
終了ページ:
362
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991798 [1558991794]
言語:
英語
請求記号:
M23500/284
資料種別:
国際会議録

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