EVIDENCE FOR LOW TEMPERATURE UV ANNEALING OF UVCVD, PECVD AND SOG BASED SiO2 FILMS
- 著者名:
- 掲載資料名:
- Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 284
- 発行年:
- 1993
- 開始ページ:
- 313
- 終了ページ:
- 318
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991798 [1558991794]
- 言語:
- 英語
- 請求記号:
- M23500/284
- 資料種別:
- 国際会議録
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2
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Low-temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications
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