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QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

著者名:
Lucovsky, G.
Ma, Y.
He, S.S.
Yasuda, T.
Stephens, D.J.
Habermehl, S.
さらに 1 件
掲載資料名:
Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
284
発行年:
1993
開始ページ:
33
終了ページ:
38
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991798 [1558991794]
言語:
英語
請求記号:
M23500/284
資料種別:
国際会議録

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