SPECTROSCOPIC ELLIPSOMETRY AND INTERFERENCE REFLECTOMETRY MEASUREMENTS OF CVD SILICON GROWN ON OXIDIZED SILICON
- 著者名:
- 掲載資料名:
- Microcrystalline semiconductors : materials science & devices : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 283
- 発行年:
- 1993
- 開始ページ:
- 561
- 終了ページ:
- 566
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991781 [1558991786]
- 言語:
- 英語
- 請求記号:
- M23500/283
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
3
国際会議録
ION CHANNELING AND SPECTROSCOPIC ELLIPSOMETRY EXAMINATIONS OF THIN-FILM SiO2/EPI-Si(001) STRUCTURES
Materials Research Society | |
Materials Research Society | |
5
国際会議録
TIME-RESOLVED REFLECTIVITY MEASUREMENTS OF SILICON AND GERMANIUM USING A PULSED EXCIMER LASER
Materials Research Society |
11
国際会議録
Real Time Spectroscopic Ellipsometry Of High Deposition Rate Amorphous Silicon Grown By Hot-Wire Cvd
Materials Research Society |
6
国際会議録
Characterization of Pulsed-Leser Deposited Amorphous Diamond Films by Spectroscopic Ellipsometry
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |