GROWTH OF SINGLE CRYSTAL Si/NiSi2/Si(100) AND SiCoSi2/Si(100) STRUCTURES BY MOLECULAR BEAM EPITAXY AND FURNACE ANNEALING

GROWTH OF SINGLE CRYSTAL Si/NiSi2/Si(100) AND SiCoSi2/Si(100) STRUCTURES BY MOLECULAR BEAM EPITAXY AND FURNACE ANNEALING

著者名:

掲載資料名:

Semiconductor heterostructures for photonic and electronic applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

281

発行年:

1993

開始ページ:

641

終了ページ:

646

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991767 [155899176X]

言語:

英語

請求記号:

M23500/281

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015765
シリーズID:	PA00000011
会議名:	Symposium on semiconductor heterostructures for photonic and electronic applications
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.11.30-1992.12.04

類似資料:

1 国際会議録 TOPOGRAPHY OF Si (111): CLEAN SURFACE PREPARATION AND SILICON MOLECULAR BEAM EPITAXY Tung, R.T., Schrey, F., Eaglesham, D.J. Materials Research Society	7 国際会議録 Epitaxial NiSi2 and CoSi2 Interfaces Tung T. R., Levi J. F. A., Schrey F., Anzlowar M. Plenum Press
2 国際会議録 THE FABRICATION OF NiSi2/Si(100) INTERFACES WITH CONTROLLED MORPHOLOGIES Sullivan, J.P., Tung, R.T., Schrey, F., Graham, W.R. Materials Research Society	8 国際会議録 RELATIONSHIP BETWEEN INTERFACE STRUCTURE AND SCHOTTKY BARRIER HEIGHT Tung, R. T., Sullivan, J. P., Schrey, F. MRS - Materials Research Society
3 国際会議録 *SINGLE CRYSTAL NiSi2/Si INTERFACES: FABRICATION, STRUCTURES, AND SCHOTTKY BARRIER HEIGHTS Tung, R. T., Sullivan, J. P., Schrey, F., Levi, A. F. J. Materials Research Society	9 国際会議録 Ti-Interlayer Mediated Epitaxy of CoSi2 with Ti Capping Tung, R. T., Schrey, F. MRS - Materials Research Society
4 国際会議録 GROWTH AND EPITAXIAL CoSi2 AND NiSi2 ON (111), (100) AND (110) Si AT ROOM TEMPERATURE Tung, R.T., Schrey, F. Materials Research Society	10 国際会議録 Transport studies in single-crystal films of CoSi2 and NiSi2 Hensel, J. C., Tung, R. T., Poate, J. M., Unterwald, F. C., Jacobson, D. C. North-Holland
5 国際会議録 CoSi2/Si(111) INTERFACE STRUCTURE AND ITS INFLUENCE ON THE SCHOTTKY BARRIER Sullivan, J. P., Graham, W. R., Schrey, F., Eaglesham, D. J., Kola, R., Tung, R. T. MRS - Materials Research Society	11 国際会議録 ORIENTATIONS OF ULTRATHIN NiSi2 LAYERS ON Si Tung, R.T. Materials Research Society
6 国際会議録 *AN INTERFACIAL PHASE TRANSFORMATION IN CoSi2/Si (111) Eaglesham, D.J., Tung, R.T., Headrick, R.L., Robinson, I.K., Schrey, F. Materials Research Society	12 国際会議録 *EPITAXIAL SILICIDES: A SUMMARY OF RECENT DEVELOPMENTS Tung, R.T., Schrey, F. Materials Research Society

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