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UHV-MOCVD GROWTH AND IN SITU CHARACTERIZATION OF EPITAXIAL TiO2 FILMS

著者名:
Chen, Samuel
Gysling, H.J.
Paz-Pujalt, G.R.
Blanton, T.N.
Castro, T.
Chen, K.M.
Fictorie, C.
Gladfelter, W.L.
Franciosi, A.
Cohen, P.I.
Evans, J.F.
さらに 6 件
掲載資料名:
Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
280
発行年:
1993
開始ページ:
173
終了ページ:
178
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991750 [1558991751]
言語:
英語
請求記号:
M23500/280
資料種別:
国際会議録

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