REMOTE PLASMA CLEANING AND ION-INDUCED HYDROGEN DESORPTION FROM THE SILICON (100) SURFACE AND ITS APPLICATIONS TO Si EPITAXY

REMOTE PLASMA CLEANING AND ION-INDUCED HYDROGEN DESORPTION FROM THE SILICON (100) SURFACE AND ITS APPLICATIONS TO Si EPITAXY

著者名:

Kinosky, David S.

掲載資料名:

Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

279

発行年:

1993

開始ページ:

831

終了ページ:

836

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991743 [1558991743]

言語:

英語

請求記号:

M23500/279

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015763
シリーズID:	PA00000011
会議名:	Symposium on beam-solid interactions
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.11.30-1992.12.04

類似資料:

1 国際会議録 HYDROGEN PLASMA CLEANING OF THE Si(100) SURFACE: REMOVAL OF OXYGEN AND CARBON AND THE ETCHING OF Si Kinosky, David, Qian, R., Mahajan, A., Thomas, S., Munguia, P., Fretwell, J., Banerjee, S., Tasch, A. MRS - Materials Research Society	7 国際会議録 GROWTH AND HIGH RESOLUTION TEM CHARACTERIZATION OF Ge Si1-x/Si HETERO-STRUCTURES BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Qian, R., Chung, I., Kinosky, D., Hsu, T., Irby, J., Mahajan, A., Thomas, S., Banerjee, S., Tasch, A., Rabenberg, L., … Materials Research Society
2 国際会議録 HF/ALCOHOL PREPARATION OF WAFERS FOR THE REDUCTION OF HAZE IN LOW TEMPERATURE Si EPITAXY BY REMOTE PLASMA CHEMICAL VAPOR DEPOSITION Kinosky, D., Qian, R., Mahajan, A., Thomas, S., Munguia, P., Fretwell, J., Banerjee, S., Tasch, A., Magee, C. MRS - Materials Research Society	8 国際会議録 GROWTH AND HIGH RESOLUTION TEM CHARACTERIZATION OF GexSi1-x/Si HETERO-STRUCTURES BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION Qian, R., Chung, I., Kinosky, D., Hsu, T., Irby, J., Mahajan, A., Thomas, S., Banerjee, S., Tasch, A., Rabenberg, L., … Materials Research Society
3 国際会議録 GROWTH OF Ge-ON-Si STRUCTURES USING REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION Qian, Rong Z., Kinosky, D., Mahajan, A., Thomas, S., Fretwell, J., Munguia, P., Banerjee, S., Tasch, A. Materials Research Society	9 国際会議録 CHARACTERIZATION OF IN SITU P-TYPE ANDN-TYPE DOPED Si AND GeXSi1-X FILMS GROWN BY LOW TEMPERATURE REMOTE PLASMA CHEMICAL VAPOR DEPOSITION Thomas, S., Irby, J., Kinosky, D., Qian, R., Iqbal, I., Mahajan, A., Benerjee, S., Tasch, A, Magee, C. Materials Research Society
4 国際会議録 *IN SITU LOW TEMPERATURE CLEANING AND PASSIVATION OF SILICON BY REMOTE HYDROGEN PLASMA FOR SILICON-BASED EPITAXY Banerjee, S., Tasch, A., Hsu, T., Qian, R., Kinosky, D., Irby, J., Mahajan, A., Thomas, S. Materials Research Society	10 国際会議録 HETEROEPITAXY OF Si/Si1-xGex GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION Hsu, T., Qian, R., Kinosky, D., Irby, J., Anthony, B., Banerjee, S., Tasch, A., Magee, C. Materials Research Society
5 国際会議録 RHEED OBSERVATIONS OF SILICON (100) SURFACE RECONSTRUCTION AFTER REMOTE HYDROGEN PLASMA CLEANING Hsu, T., Breaux, L., Anthony, B., Banerjee, S., Tasch, A. Materials Research Society	11 国際会議録 HYDROGEN PASSIVATION OF Si (100) BY REMOTE HYDROGEN PLASMA TREATMENT Hsu, T., Anthony, B., Breaux, L., Qian, R., Baner-jee, S., Tasch, A., Lin,. S., Marcus, H. L. Materials Research Society
6 国際会議録 THE DEPENDENCE OF DEFECT DENSITY IN GeXSi1-X/Si HETEROSTRUCTURES GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION ON DEPOSITION PARAMETERS Kinosky, D., Qian, R., Hsu, T., Irby, J., Mahajan, A., Thomas, S., Banerjee, S., Tasch, A., Magee, C., Grove, C. L. Materials Research Society	12 国際会議録 REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF EPITAXIAL SILICON ON SILICON (100) AT 150oC Hsu, T., Anthony, B., Breaux, L., Banerjee, S., Tasch, A. Materials Research Society

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