THE EFFECT OF COPPER ON THE TITANIUM-SILICON DIOXIDE REACTION AND THE IMPLICATIONS FOR SELF-ENCAPSULATING, SELF-ADHERING METALLIZATION LINES
- 著者名:
- 掲載資料名:
- Materials reliability in microelectronics II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 265
- 発行年:
- 1992
- 開始ページ:
- 205
- 終了ページ:
- 210
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991606 [1558991603]
- 言語:
- 英語
- 請求記号:
- M23500/265
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Kluwer Academic Publishers |
2
国際会議録
EFFECTIVENESS OF NITRIDE DIFFUSION BARRIERS IN A SELF-ENCAPSULATED COPPER-BASED METALLIZATION
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Kluwer Academic Publishers |
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |