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EFFECTS OF CONCURRENT Co OR Ti SILICIDATION ON TRANSIENT DIFFUSION AND END-OF-RANGE DAMAGE IN PHOSPHORUS IMPLANTED SILICON

著者名:
掲載資料名:
Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
262
発行年:
1992
開始ページ:
701
終了ページ:
706
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991576 [1558991573]
言語:
英語
請求記号:
M23500/262
資料種別:
国際会議録

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