Blank Cover Image

A NEW TWO-STEP PLASMA-ASSISTED SURFACE CLEANING-OXIDATION AND FILM-DEPOSITION PROCESS SEQUENCE FOR THE FORMATION OF Si(100)/SiO2 INTERFACES WITH LOW DENSITIES OF INTERFACIAL TRAPS

著者名:
Ma, Y.
Yasuda, T.
Habermehl, S.
He, S.S.
Stephens, D.J.
Lucovsky, G.
さらに 1 件
掲載資料名:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
259
発行年:
1992
開始ページ:
69
終了ページ:
74
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
言語:
英語
請求記号:
M23500/259
資料種別:
国際会議録

類似資料:

Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S.

Materials Research Society

Lamb, H.H., Kalem, S., Bedge, S., Yasuda, T., Ma, Y., Lucovsky, G.

Materials Research Society

Yasuda, T., Ma, Y., Habermehl, S., Kim, S.S., Lucovsky, G., Schneider, T.P., Cho, J., Nemanich R.J.

Materials Research Society

He, S. S., Stephens, D. J., Ma. Y., Yasuda, T., Habermehl, S., Lucovsky, G.

Materials Research Society

Ma, Y., Yasuda, T., Habermehl, S., Lucovsky, G.

Materials Research Society

Ma, Y., Yasuda, T., Habermehl, S., Lucovsky, G.

Materials Research Society

Habermehl, S., He, S. S., Chen, Y. L., Lucovsky, G.

MRS - Materials Research Society

Lucovsky, G., Yasuda, T., Ma, Y., Hattangady, S. V., Xu, X-L., Misra, V., Hornung, B., Wortman, J. J.

MRS - Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12