*IN SITU LOW TEMPERATURE CLEANING AND PASSIVATION OF SILICON BY REMOTE HYDROGEN PLASMA FOR SILICON-BASED EPITAXY
- 著者名:
Banerjee, S. Tasch, A. Hsu, T. Qian, R. Kinosky, D. Irby, J. Mahajan, A. Thomas, S. - 掲載資料名:
- Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 259
- 発行年:
- 1992
- 開始ページ:
- 43
- 終了ページ:
- 54
- 総ページ数:
- 12
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991545 [1558991549]
- 言語:
- 英語
- 請求記号:
- M23500/259
- 資料種別:
- 国際会議録
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