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MEASUREMENT OF VISCOELASTIC STRESS RELIEF IN PATTERNED SILICON-ON-INSULATOR COMPOSITE STRUCTURES WITH RAMAN SPECTROSCOPY

著者名:
掲載資料名:
Thin films : stresses and mechanical properties III : symposium held December 2-5, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
239
発行年:
1992
開始ページ:
201
終了ページ:
206
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991330 [1558991336]
言語:
英語
請求記号:
M23500/239
資料種別:
国際会議録

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