PLASMA SURFACE INTERACTION DURING THE GROWTH OF SEMICONDUCTOR THIN FILMS STUDIED BY IN SITU INFRARED ELLIPSOMETRY
- 著者名:
- 掲載資料名:
- Interface dynamics and growth : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 237
- 発行年:
- 1992
- 開始ページ:
- 631
- 終了ページ:
- 636
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991316 [155899131X]
- 言語:
- 英語
- 請求記号:
- M23500/237
- 資料種別:
- 国際会議録
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INFLUENCE OF ION BOMBARDMENT ON THE NUCLEATION AND GROWTH OF PLASMA DEPOSITED AMORPHOUS SILICON
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