INVESTIGATIONS OF RESIDUAL CHLORINE ON ETCHED AlCu METAL LINES BY TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF)
- 著者名:
- 掲載資料名:
- Materials reliability issues in microelectronics : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 225
- 発行年:
- 1991
- 開始ページ:
- 329
- 終了ページ:
- 334
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991194 [1558991190]
- 言語:
- 英語
- 請求記号:
- M23500/225
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society | |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Use and function of TXRF(total reflection x-ray fluorescence)for routine in fab metallic monitoring
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |