CHARACTERIZATION OF ION IMPLANTED ZnSe/GaAs UPON RAPID THERMAL ANNEALING
- 著者名:
Lowen, P. D. Jones, K. S. Ochoa, R. Simmons, J. Wang, Y. H. Park, R. M. Wilson, R. - 掲載資料名:
- Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 224
- 発行年:
- 1991
- 開始ページ:
- 467
- 終了ページ:
- 472
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991187 [1558991182]
- 言語:
- 英語
- 請求記号:
- M23500/224
- 資料種別:
- 国際会議録
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10
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THERMAL EXPANSION BEHAVIOR OF ZnSe and ZnS0.03S0.97 EPILAYERS ON GaAs AT TEMPERATURES 25。?C-250。?C
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