*ION BEAM SPUTTER DEPOSITION OF FERROELECTRIC OXIDE THIN FILMS

*ION BEAM SPUTTER DEPOSITION OF FERROELECTRIC OXIDE THIN FILMS

著者名:

Graettinger, Thomas M.

掲載資料名:

Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

223

発行年:

1991

開始ページ:

273

終了ページ:

282

総ページ数:

10

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991170 [1558991174]

言語:

英語

請求記号:

M23500/223

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015707
シリーズID:	PA00000011
会議名:	Symposium on low energy ion beam and plasma modification of materials
回次:	1991
会議開催地:	Anaheim, CA, USA
会議開催年:	1991.04.30-1991.05.02

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