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ANALYSIS AND CALIBRATION OF THE FLOW CHARACTERISTICS OF A PRESSURE CONTROLLED VAPOR SOURCE FOR GAS SOURCE DOPING: CdTe:I

著者名:
Rajavel, D.
Wagner, B. K.
Maruyama, K.
Benz II, R. G.
Conte, A.
Summers, C. J.
さらに 1 件
掲載資料名:
Atomic layer growth and processing : symposium held April 29 - May 1, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
222
発行年:
1991
開始ページ:
275
終了ページ:
282
総ページ数:
8
出版情報:
Pittsburgh: Materials Research Society
ISSN:
02729172
ISBN:
9781558991163 [1558991166]
言語:
英語
請求記号:
M23500/222
資料種別:
国際会議録

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