REAL-TIME ANALYSIS OF IN-SITU SPECTROSCOPIC ELLIPSOMETRIC DATA DURING MBE GROWTH OF III-V SEMICONDUCTORS
- 著者名:
Johs, B. Edwards, J. L. Shiralagi, K. T. Droopad, R. Choi, K. Y. Maracas, G. N. Meyer, D. Cooney, G. T. Woollam, John A. - 掲載資料名:
- Atomic layer growth and processing : symposium held April 29 - May 1, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 222
- 発行年:
- 1991
- 開始ページ:
- 75
- 終了ページ:
- 80
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991163 [1558991166]
- 言語:
- 英語
- 請求記号:
- M23500/222
- 資料種別:
- 国際会議録
類似資料:
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8
国際会議録
VARIABLE ANGLE OF INCIDENCE SPECTROSCOPIC ELLIPSOMETRIC STUDY OF SEMICONDUCTOR MULTILAYER STRUCTURES
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