Blank Cover Image

SILICON GERMANIUM HETEROBIPOLAR TRANSISTOR STRUCTURES WITH EXTREMELY HIGH BASE DOPING

著者名:
掲載資料名:
Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
220
発行年:
1991
開始ページ:
451
終了ページ:
456
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991149 [155899114X]
言語:
英語
請求記号:
M23500/220
資料種別:
国際会議録

類似資料:

Kasper, E.

Electrochemical Society

Presting, H., Menczigar, U., Abstreiter, G., Kibbel, H., Kasper, E.

Materials Research Society

Hansch, W., Eisele, I., Kibbel, H., Konig, U.

MRS - Materials Research Society

Menczigar, U., Abstreiter, G., Kibbel, H., Presting, H., Kasper, E.

Materials Research Society

Kasper,Erich, Reitemann,G., Eberhardt,Jochen

SPIE - The International Society for Optical Engineering

Jager, W., Leifer, K., Ehrhart, P., Kasper, E., Kibbel, H.

Materials Research Society

E. Kasper

Trans Tech Publications

Subramanian,V., Saraswat,K.C., Hovagimian,H., Mehlhaff,J.

SPIE-The International Society for Optical Engineering

Presting, H., Uschmann, J., Hepp, M., Thonke, K., Sauer, R., Kibbel, H., Cabanski, W., Jaros, M.

SPIE

Gruhle, A., Kibbel, H., Schurr, A., Behammer, D., Koenig, U.

Electrochemical Society

Presting,H., Konle,J., Hepp,M., Kibbel,H., Thonke,K., Sauer,R., Cabanski,W.A., Jaros,M.

SPIE - The International Society for Optical Engineering

Yang, D., Li, H., Yu, X., Ma, X., Tian, D., Li, L., Qua, S.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12