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THE INVESTIGATION OF FLUORINE EFFECTS ON CHARGE TRAPPING AND INTERFACE STATE GENERATION IN MOS STRUCTURES

著者名:
掲載資料名:
Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
219
発行年:
1991
開始ページ:
825
終了ページ:
830
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991132 [1558991131]
言語:
英語
請求記号:
M23500/219
資料種別:
国際会議録

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