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THE SLOPE ETCHING OF a-Si:H FILM USING CF4 + O2 GAS

著者名:
Sung, K.H.
Park, B.W.
Kim, J.I.
Kim, J.J.
Bae, H.K.
Park, Y.H.
Hur, C.W.
さらに 2 件
掲載資料名:
Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
219
発行年:
1991
開始ページ:
811
終了ページ:
818
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991132 [1558991131]
言語:
英語
請求記号:
M23500/219
資料種別:
国際会議録

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