Blank Cover Image

DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE Si,C ALLOY THIN FILMS BY A REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION PROCESS

著者名:
掲載資料名:
Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
219
発行年:
1991
開始ページ:
751
終了ページ:
756
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991132 [1558991131]
言語:
英語
請求記号:
M23500/219
資料種別:
国際会議録

類似資料:

Wang, C:, Bjorkman, C.H., Lee, D.R., Williams, M.J., Lucovsky, G.

Materials Research Society

Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G.

MRS - Materials Research Society

Wang, C, Parsons, G. N., Kim, S. S., Buehler, E. C., Nemanich, R. J., Locuvsky, G.

Materials Research Society

Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S.

Materials Research Society

Choi, S.W., Bachmann, K.J., Lucovsky, G.

Materials Research Society

Theil, J.A., Lucovsky, G., Hattangady, S.V., Fountain, G.G., Markunas, R.J.

Materials Research Society

Misra, V., Lazar, H., Kulkarni, M., Wang, Z., Lucovsky, G., Hauser, J. R.

MRS - Materials Research Society

Lucovsky, G., Richard, P.D., Tsu, D.V., Markunas, R.J.

Materials Research Society

Lucovsky G., Tsu, D.V., Markunas R.J.

Materials Research Society

Tsu, D. V., Lucovsky, G.

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12