DEPOSITION AND CHARACTERIZATION OF NEAR ‘INTRINSIC” μc-Si FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION -RPECVD
- 著者名:
- 掲載資料名:
- Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 219
- 発行年:
- 1991
- 開始ページ:
- 388
- 終了ページ:
- 394
- 総ページ数:
- 7
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991132 [1558991131]
- 言語:
- 英語
- 請求記号:
- M23500/219
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Materials Research Society |
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MRS - Materials Research Society |
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American Institute of Chemical Engineers |
12
国際会議録
Interfacial Properties of Si-Si3N4 Formed by Remote Plasma Enhanced Chemical Vapor Deposition
MRS - Materials Research Society |