X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDIES OF Si+ IMPLANTATION IN SI GaAs

X-RAY DOUBLE-CRYSTAL DIFFRACTION STUDIES OF Si+ IMPLANTATION IN SI GaAs

著者名:

掲載資料名:

Advances in surface and thin film diffraction : symposium held November 27-29, 1990, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

208

発行年:

1991

開始ページ:

131

終了ページ:

136

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991002 [155899100X]

言語:

英語

請求記号:

M23500/208

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015692
シリーズID:	PA00000011
会議名:	Symposium on advances in surface and thin film diffraction
回次:	1990
会議開催地:	Boston, MA, USA
会議開催年:	1990.11.27-1990.11.29

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