STRUCTURAL DEFECTS OF SILICON EPITAXY AND EPI/SUBSTRATE INTERFACE RELATED TO IMPROPER IN-SITU SURFACE CLEANING AT LOW TEMPERATURES

STRUCTURAL DEFECTS OF SILICON EPITAXY AND EPI/SUBSTRATE INTERFACE RELATED TO IMPROPER IN-SITU SURFACE CLEANING AT LOW TEMPERATURES

著者名:

掲載資料名:

Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

202

発行年:

1991

開始ページ:

401

終了ページ:

406

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990944 [1558990941]

言語:

英語

請求記号:

M23500/202

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015686
シリーズID:	PA00000011
会議名:	Symposium on evolution of thin-film and surface microstructure
回次:	1990
会議開催地:	Boston, MA, USA
会議開催年:	1990.11.26-1990.12.01

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6 国際会議録 VERY LOW TEMPERATURE DEPOSITION OF POLYCRYSTALLINE SILICON FILMS WITH MICRO-METER-ORDER GRAINS ON SiO2 Wang, Kun-Chih, Yew, Tri-Rung, Hwang, Huey-Liang MRS - Materials Research Society	12 国際会議録 SURFACE CLEANING AND PASSIVATION FOR THE GROWTH OF Si/OXIDE/Si STRUCTURES Wang, Kun-Chih, Hwang, Huey-Liang, Kung, Chung-Yuan, Yew, Tn-Rung Materials Research Society

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