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Si(100) SURFACE PREPARATION BY IN-SITU OR IN-VACUO EXPOSURE TO REMOTELY PLASMA-GENERATED ATOMIC HYDROGEN: APPLICATIONS TO DEPOSITED SiO2 AND EPITAXIAL GROWTH OF Si

著者名:
Yasuda, T.
Ma, Y.
Habermehl, S.
Kim, S.S.
Lucovsky, G.
Schneider, T.P.
Cho, J.
Nemanich R.J.
さらに 3 件
掲載資料名:
Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
202
発行年:
1991
開始ページ:
395
終了ページ:
400
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990944 [1558990941]
言語:
英語
請求記号:
M23500/202
資料種別:
国際会議録

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