μc SILICON THIN FILMS DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITORS PROCESS

μc SILICON THIN FILMS DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITORS PROCESS

著者名:

Wang, C

掲載資料名:

Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

192

発行年:

1990

開始ページ:

535

終了ページ:

540

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990814 [155899081X]

言語:

英語

請求記号:

M23500/192

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015676
シリーズID:	PA00000011
会議名:	Symposium on amorphous silicon technology
回次:	1990
会議開催地:	San Francisco, CA, USA
会議開催年:	1990.04.17-1990.04.20

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